The main objective of the Action was to improve the physical and electronic properties of thin films (< 20 micrometer) made by chemical solution deposition techniques, focusing on the sol-gel, liquid source CVD and spray pyrolysis methods. Possible application are the high quality thin films required for the microelectronics, optoelectronics, and microsystems.
In order to improve the quality of such a thin films, better knowledge of the precursor chemistry and processing, microstructure and nanostructure, and also the physics was required. The Action worked on thin films and multi-layer structures of a variety of electroactive materials (dielectrics, ferroelectrics, conductors, optically active materials. Process parameters were optimized, reducing number of defects (pores, pinholes, cracks, impurities, stoichiometry deviations, excess charge in the film, poor transparency) in thin films produced by chemical solution deposition techniques. Furthermore, chemical solution deposition processes have been developed for large area substrates and the thermal budget required for specific chemical solution deposition processes has been reduced. As an example of application can be CSD-derived K(Ta, Nb)O3 films for the tunable microwave devices and the organic films growth by surface ATRP (Atom Transfer Radical Polymerization) in water for biocompatible materials, biosensors and optics. Also low temperature processing of ferroelectric films for computer memories and piezoelectric applications and nanosize ferroelectric structures obtained via chemical solution routes has been studied. The Action worked on new photo-assisted chemical deposition processes.
One of the important aspects of the work was the improvement the environmental compatibility of chemical solution deposition processes in order to meet environment, safety, and health requirements.
